Directed Self-assembly of Block Co-polymers for Nano-manufacturingRoel GronheidLabel: Woodhead Publishing LtdDescription: The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design production applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA reviewing templates and patterning using topographical and chemically modified surfaces line edge roughness and dimensional control x-ray scattering for characterization and nanoscale driven assembly. Finally Part 3 discusses application areas and related issues for DSA in nano-manufacturing including for basic logic circuit design the inverse DSA problem design decomposition and the modelling and analysis of large scale template self-assembly manufacturing techniques.